Varies
Avg. Amount Awarded
107
Days
May 31 2025
Application Deadline
1
Awarded last year
N/A
Renewable
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What you'll need:
  • Checkmark Application Form
  • Checkmark Recommendations Or References
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SPIE-BACUS Scholarship

Description

The SPIE-BACUS Scholarship recognizes outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution. The scholarship is awarded to a student in the field of microlithography with an emphasis on photomask technology and/or optical or EUV photolithography technologies. Applicants who have received a terminal degree (MD, JD, PhD, etc.) are not eligible to apply. Applicants must be a student member of SPIE. Two recommendations are required. Family members, relatives and students are not eligible to submit a recommendation. Please visit the scholarship's website or contact SPIE for more information.

Amount Details

$5,000
Low Amount Awarded

Eligibility Requirements

  • CheckmarkMust be an undergraduate student or a graduate student
  • CheckmarkMust attend a university or a four-year college
  • CheckmarkMust not be attending high school currently
  • CheckmarkMust study full-time

How to Apply

What you'll need:

  • Checkmark Application Form
  • Checkmark Recommendations Or References
For more info, please visit our site
Contact scholarships@spie.org
Tel: 360-676-3290
Fax: 360-647-1445 Address PO Box 10
Bellingham, WA 98227-0010