The SPIE-BACUS Scholarship recognizes outstanding contributions to the photomask industry that have at least one of the following attributes: a fundamental change or innovation, an enduring contribution, and/or an enabling contribution. This scholarship is awarded to an undergraduate or graduate student in the field of microlithography with an emphasis on optical tooling and/or semiconductor manufacturing technologies. Applicants must be a student member of SPIE. The SPIE-BACUS Scholarship was set up in 1998 to reward the most qualified students who wish to work in the fields of photomask and microlithography manufacturing for the semiconductor industry. Applicants must submit two recommendations. Family members, relatives and students are not eligible to submit a recommendation. Please visit the scholarship's website for more information.